In this thesis , we have mainly studied the characteristics of chf3 , c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ) . the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed . it was showed that h , f , c2 were the main radicals among radicals of h , f , c2 , ch and f2 in chf3 ecr plasma 重點研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放電等離子體中基團的分布;分析了不同基團的相對密度隨宏觀放電條件(微波輸入功率、放電氣壓、源氣體流量比)的變化規(guī)律;探討了等離子體中各種基團的生成途徑;在不同源氣體流量比的條件下沉積了a - c : f薄膜并通過傅立葉變化紅外吸收光譜( ftir )的測量得到了薄膜中鍵結構的信息;分析了a - c : f薄膜的沉積速率及其鍵結構與等離子體空間基團分布狀態(tài)之間的關聯(lián)。